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Shimojo, Kojiro; Naganawa, Hirochika; Kubota, Fukiko*; Goto, Masahiro*
no journal, ,
no abstracts in English
Tomioka, Osamu; Shimojo, Kojiro; Naganawa, Hirochika; Meguro, Yoshihiro; Takahashi, Kuniaki
no journal, ,
no abstracts in English
Meguro, Yoshihiro; Tomioka, Osamu; Dung, L. T. K.*; Takahashi, Kuniaki
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no abstracts in English
Baba, Yuji; Sekiguchi, Tetsuhiro; Shimoyama, Iwao; Nath, K. G.*; Hirao, Norie*
no journal, ,
no abstracts in English
Yamada, Yoichi; Yamamoto, Hiroyuki; Oba, Hironori; Sasase, Masato*; Esaka, Fumitaka; Yamaguchi, Kenji; Udono, Haruhiko*; Shamoto, Shinichi; Yokoyama, Atsushi; Hojo, Kiichi
no journal, ,
Si in natural Si has been widely used for a doping source, since Si can be transmuted into P by thermal neutron (Neutron Transmutation Doping, NTD). In the present study, Si-enriched thin film has been fabricated in order to demonstrate the local NTD. The Si-enriched film with thickness of 100 nm was deposited on the Si(100) substrate by plasma enhanced chemical vapor deposition using Si-enriched SiF as the source gases. Nanostructure of films and changes of electronic properties by the neutron irradiation will be discussed.
Suzuki, Chikashi
no journal, ,
no abstracts in English
Hirao, Norie*; Baba, Yuji; Sekiguchi, Tetsuhiro; Shimoyama, Iwao; Honda, Mitsunori; Deng, J.
no journal, ,
no abstracts in English
Narita, Ayumi*; Baba, Yuji; Honda, Mitsunori; Hirao, Norie*; Yaita, Tsuyoshi
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no abstracts in English
Honda, Mitsunori; Baba, Yuji; Hirao, Norie*; Deng, J.; Sekiguchi, Tetsuhiro
no journal, ,
no abstracts in English